Jun 30, 2022  
2018-2019 Undergraduate Bulletin 
    
2018-2019 Undergraduate Bulletin [ARCHIVED]

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APRL-373 Advanced Pattern Development


(3 cr.)
Repeatable for Credit: No
Advanced pattern development by flat pattern making and draping methods, with an emphasis on creative pattern modifications and fit evaluation for global production.
Prerequisite: Take APRL-180  



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