Nov 23, 2024  
2017-2018 Undergraduate Bulletin 
    
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2017-2018 Undergraduate Bulletin [ARCHIVED]

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APRL-373 Advanced Pattern Development

(3 cr.)
Repeatable for Credit: No
Advanced pattern development by flat pattern making and draping methods, with an emphasis on creative pattern modifications and fit evaluation for global production.
Prerequisite: Take APRL-180  


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